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Atomic layer deposition of high-κ dielectric films for diamond MOS structures,
Universidade de Aveiro,
PhD Student,
Aneeta Jaggernauth,
Supervisor: J. C. Mendes,
Co-supervisor: R. Silva,
out-2016 - jul-2022
A. Jaggernauth,
R. Silva,
M Neto,
F. Oliveira,
I. Bdikin,
M.P. Alegre,
M. Gutiérrez,
D. Araújo,
J. C. Mendes,
R.F.P.S Silva,
Interfacial integrity enhancement of atomic layer deposited alumina on boron doped diamond by surface plasma functionalization,
Surface and Coatings Technology,
Vol. 397,
No. N.A.,
pp. 125991 - 125991,
September,
2020
| BibTex
A. Jaggernauth,
J. C. Mendes,
R. Silva,
Atomic layer deposition of high-κ layers on polycrystalline diamond for MOS devices: a review,
Journal of Materials Chemistry C,
Vol. 8,
No. N.A.,
pp. 13127 - 13153,
September,
2020
| BibTex
A. Jaggernauth,
R. Silva,
M Neto,
F. Oliveira,
I. Bdikin,
J. C. Mendes,
R. Silva,
The Effect of Surface Functionalization on the Interfacial Integrity of Boron Doped Diamond and Atomic Layer Deposited Alumina,
Materials Research Society (MRS) - Spring Meeting,
Phoenix, Arizona,
United States,
April,
2019
| BibTex
Aneeta Jaggernauth